Normy JIS - Japonské technické normy - strana 652

Surface chemical analysis -- X-ray photoelectron spectrometers -- Calibration of energy scales

Norma vydána dne 30.4.2002

Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials

Norma vydána dne 30.4.2002

Surface chemical analysis -- Vocabulary -- Part 1: General terms and terms used in spectroscopy

Norma vydána dne 21.8.2017

Surface chemical analysis -- Vocabulary -- Part 2: Terms used in scanning-probe microscopy

Norma vydána dne 21.8.2017

Surface chemical analysis-Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Norma vydána dne 20.1.2026

Microbeam analysis -- Scanning electron microscopy -- Guidelines for calibrating image magnification

Norma vydána dne 20.11.2019

Surface chemical analysis -- Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry

Norma vydána dne 20.7.2020

Non-dispersive infrared gas analyzer

Norma vydána dne 31.1.1984

Surface chemical analysis -- X-ray photoelectron spectroscopy -- Repeatability and constancy of intensity scale

Norma vydána dne 22.7.2014

Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry

Norma vydána dne 20.10.2015