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Standard Guide for Specimen Preparation and Mounting in Surface Analysis
Přeložit název
NORMA vydána dne 1.12.2020
Označení normy: ASTM E1078-14(2020)
Datum vydání normy: 1.12.2020
Kód zboží: NS-1013604
Počet stran: 10
Přibližná hmotnost: 30 g (0.07 liber)
Země: Americká technická norma
Kategorie: Technické normy ASTM
Keywords:
Auger electron spectroscopy, secondary ion mass spectroscopy, specimen mounting, specimen preparation, specimen treatment, surface analysis, X-ray photoelectron spectroscopy,, ICS Number Code 71.040.50 (Physicochemical methods of analysis)
Significance and Use | ||||||||||||
4.1?Proper preparation and mounting of specimens is particularly critical for surface analysis. Improper preparation of specimens can result in alteration of the surface composition and unreliable data. Specimens should be handled carefully so as to avoid the introduction of spurious contaminants in the preparation and mounting process. The goal must be to preserve the state of the surface so that the analysis remains representative of the original. 4.2?AES, XPS or ESCA, and SIMS are sensitive to surface layers that are typically a few nanometres thick. Such thin layers can be subject to severe perturbations caused by specimen handling (1)4 or surface treatments that may be necessary prior to introduction into the analytical chamber. In addition, specimen mounting techniques have the potential to affect the intended analysis. 4.3?This guide describes methods that the surface analyst may need to minimize the effects of specimen preparation when using any surface-sensitive analytical technique. Also described are methods to mount specimens so as to ensure that the desired information is not compromised. 4.4?Guide E1829 describes the handling of surface sensitive specimens and, as such, complements this guide. |
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1. Scope | ||||||||||||
1.1?This guide covers specimen preparation and mounting prior to, during, and following surface analysis and applies to the following surface analysis disciplines: 1.1.1?Auger electron spectroscopy (AES), 1.1.2?X-ray photoelectron spectroscopy (XPS and ESCA), and 1.1.3?Secondary ion mass spectrometry (SIMS). 1.1.4?Although primarily written for AES, XPS, and SIMS, these methods will also apply to many surface sensitive analysis methods, such as ion scattering spectrometry, low energy electron diffraction, and electron energy loss spectroscopy, where specimen handling can influence surface sensitive measurements. 1.2?The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard. 1.3?This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.4?This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. |
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2. Referenced Documents | ||||||||||||
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