GB/T 25188-2010

Thickness measurements for ultrathin silicon oxide layers on silicon wafers X-ray photoelectron spectroscopy

NORMA vydána dne 26.9.2010

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The information about the standard:

Designation standards: GB/T 25188-2010
Publication date standards: 26.9.2010
Country: Chinese technical standard
Kategorie: Technické normy GB