ASTM F2113-01(2011)

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)

NORMA vydána dne 1.6.2011

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The information about the standard:

Designation standards: ASTM F2113-01(2011)
Note: NEPLATNÁ
Publication date standards: 1.6.2011
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Kategorie: Technické normy ASTM

Annotation of standard text ASTM F2113-01(2011) :

Keywords:
electronics, purity analysis, purity grade, sputtering, target, thin film, Electronic thin-film applications, High-purity metallic sputtering targets, Impurities--electronic materials/applications, Semiconductor device testing, Sputtering process/targets, Target specifications, Thin film applications, ICS Number Code 29.045 (Semiconducting materials)