Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)
Designation standards: ASTM F518-77(1991)E01
Note: NEPLATNÁ
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Kategorie: Technické normy ASTM