Standard Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure (Withdrawn 2003)
NORMA vydána dne 10.12.2002
Označení normy: ASTM F374-02
Poznámka: NEPLATNÁ
Datum vydání normy: 10.12.2002
Počet stran: 17
Přibližná hmotnost: 51 g (0.11 liber)
Země: Americká technická norma
Kategorie: Technické normy ASTM
Keywords:
collinear four-probe array, diffused layer, epitaxial layer, four-point probe method, implanted layer, Ion-implanted layer, probe methods-four-point probe, resistance (electrical)-semiconductors, sheet resistance, silicon semiconductors, sheet resistance-Si-epitaxial/diffused/ion-implanted layers, using, in-line four-point probe, ICS Number Code 29.045 (Semiconducting materials)