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ASTM F1727-02

Standard Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 2003)

NORMA vydána dne 10.12.2002

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The information about the standard:

Designation standards: ASTM F1727-02
Note: NEPLATNÁ
Publication date standards: 10.12.2002
The number of pages: 3
Approximate weight : 9 g (0.02 lbs)
Country: American technical standard
Kategorie: Technické normy ASTM

Annotation of standard text ASTM F1727-02 :

Keywords:
defects, dislocation, epitaxy, hillock, imperfections, oxidation, preferential etch, shallow pit, silicon, slip, stacking fault, swirl, ICS Number Code 29.045 (Semiconducting materials)